Nyob rau hauv lub teb ntawm niaj hnub precision ua, vim cov tsooslaser marking tshuabsiv laser thermal ua technology, kev loj hlob ntawm fineness yog txwv, thiab qhov tshwm sim ntawm ultraviolet laser marking tshuab lov no deadlock, uas siv ib yam ntawm cov txheej txheem txias, cov txheej txheem yog hu ua "photoetching" nyhuv, "txias ua" (ultraviolet) photons nrog siab load zog yuav ua txhaum cov tshuaj bonds nyob rau hauv cov ntaub ntawv los yog ib puag ncig nruab nrab, yog li ntawd cov txheej txheem nyob ze thiab tsis muaj kev puas tsuaj. los yog thermal deformation nyob rau hauv cheeb tsam, thiab cov khoom ua tiav kawg muaj cov npoo du thiab tsis tshua muaj carbonization, yog li cov fineness thiab thermal cuam tshuam yog txo, uas yog ib tug zoo leap mus rau hauv lub laser technology.
Cov tshuaj tiv thaiv kev ua haujlwm ntawm ultraviolet laser ua tiav los ntawm photochemical ablation, uas yog, tso siab rau lub zog laser los rhuav tshem cov kev sib txuas ntawm cov atoms lossis molecules, ua rau lawv gasify thiab evaporate li me me molecules. Qhov chaw tsom yog qhov me me, thiab qhov chaw ua haujlwm kub cuam tshuam yog qhov me me, yog li nws tuaj yeem siv rau ultra-fine marking thiab cov khoom siv tshwj xeeb.
Qauv | FL-UV 3 | FL-UV 5 |
Laser zog | 3W | 5W |
Txoj kev txias | Cua txias | |
Laser wavelength | 355nm ua | |
Tso zis zog | > 3W @ 30KHz | > 5W @ 40KHz |
Qhov siab tshaj plaws pulse zog | 0.1mJ @ 30KHz | 0.12mJ @ 40KHz |
Pulse Repetition zaus | 1-150KHz | 1-150KHz |
Pulse duration | <15ns@30KHz | <18ns@40KHz |
Nruab nrab zog stability | <3% | <3% |
Polarization piv | > 100:1 Kab rov tav | > 100:1 Kab rov tav |
Beam ncig | > 90% | > 90% |
Environment Requirement | Ua haujlwm kub: 18 ° -26 °, Humidity: 30% - 85%. | |
Tswj Board & Software | JCZ EZcad 2 |